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Rare Earth Oxide Thin Films: Growth, Characterization, and Applications by Marco

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Item specifics

Condition
New: A new, unread, unused book in perfect condition with no missing or damaged pages. See the ...
ISBN-13
9783540357964
Book Title
Rare Earth Oxide Thin Films
ISBN
9783540357964
Subject Area
Technology & Engineering, Science
Publication Name
Rare Earth Oxide Thin Films : Growth, Characterization, and Applications
Item Length
9.3 in
Publisher
Springer Berlin / Heidelberg
Subject
Materials Science / Thin Films, Surfaces & Interfaces, Materials Science / Electronic Materials, Physics / General
Publication Year
2006
Series
Topics in Applied Physics Ser.
Type
Textbook
Format
Mixed Lot
Language
English
Author
Giovanna Scarel
Item Width
6.1 in
Item Weight
29.2 Oz
Number of Pages
Xvi, 427 Pages

About this product

Product Information

Thin rare earth (RE) oxide films are emerging materials for microelectronic, nanoelectronic, and spintronic applications. This book aims to identify proper methodologies for the development of RE oxides thin films and to evaluate their effectiveness as innovative materials in different applications.

Product Identifiers

Publisher
Springer Berlin / Heidelberg
ISBN-10
3540357963
ISBN-13
9783540357964
eBay Product ID (ePID)
56990473

Product Key Features

Author
Giovanna Scarel
Publication Name
Rare Earth Oxide Thin Films : Growth, Characterization, and Applications
Format
Mixed Lot
Language
English
Subject
Materials Science / Thin Films, Surfaces & Interfaces, Materials Science / Electronic Materials, Physics / General
Publication Year
2006
Series
Topics in Applied Physics Ser.
Type
Textbook
Subject Area
Technology & Engineering, Science
Number of Pages
Xvi, 427 Pages

Dimensions

Item Length
9.3 in
Item Width
6.1 in
Item Weight
29.2 Oz

Additional Product Features

LCCN
2006-935383
Intended Audience
Scholarly & Professional
Series Volume Number
106
Number of Volumes
1 Vol.
Lc Classification Number
Q1-390
Table of Content
Introduction.- ALD, MOCVD, and MBE deposition of rare earth oxides. - Requirements of precursor for MOCVD and ALD of rare earth oxides.- Models for ALD and MOCVD growth of rare earth oxides.- Growth of oxides with complex stoichiometry by ALD, e.g. La1-xCaxMnO3.- Fabrication and characterization of rare earth scandate thin films prepared by pulsed laser deposition.- Film and interface layer composition of rare earth (Lu, Yb) oxides deposited by ALD.- Local atomic environment of high-k oxides on silicon probed by X-ray absorption spectroscopy, and advanced transmission electron microscopy techniques (TEM-EELS).- Strain-relief at internal dielectric interfaces in high-k gate stacks with transition metal and rare earth atom oxide dielectrics.- Electrical characterization of rare earth oxides grown by ALD.- Dielectric properties of rare-earth oxides: general trends from theory.- Charge traps in high-k dielectrics: ab initio study of defects in Pr-based materials.- Experimental determination of the band offset of rare earth oxides on various semiconductors.- Band edge electronic structure, and band offsets of transition metal/rare earth oxide dielectrics.- Rare earth oxides in microelectronics.- Requirements of oxides as gate dielectrics for CMOS devices, and ultimate scaling.- The magneto-electric properties of RMnO compounds.- Sesquioxides as host materials for rare-earth-doped bulk lasers and active waveguides.
Copyright Date
2007
Dewey Decimal
621.3815/2
Dewey Edition
22
Illustrated
Yes

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United States
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